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干法刻蝕技術(shù)*，在芯片制造的過(guò)程中，硅片表面圖形的形成主要依靠光刻和刻蝕兩大模塊。光刻的目的是在硅片表面形成所需的光刻膠圖形，刻蝕則緊接其后地將光刻膠的圖形轉(zhuǎn)移到襯底或襯底上的薄膜層上。隨著特征尺寸要求越來(lái)越小，對(duì)光刻和刻蝕的要求也越來(lái)越高。通常一個(gè)刻蝕工藝包含以下特性：良好的刻蝕速率均勻性(Uniformity)，不僅僅是片內(nèi)的均勻性(WithinWafer)，還包括片與片之間(WafertoWafer)，批次與批次之間(LottoLot)。高選擇比(HighSelecti...

Thispageintendstopresentthedifferentmajortechniquesusedinmicrofabricationtoetchamaterialsothatthelayeryou'vedepositedwilllettheshapeyouwantedappear.Etchingisalargeenoughsubjecttowriteawholeencyclopediaaboutit.Ijustwanttoshowthemaindifferenc...

Thispagetalkaboutthedifferentwaystodepositmaterialsinmicrotechnology(referedtowithbarbarianwordssuchaslpcvd,sputtering,evaporation-thermalａnde-beam,pecvdetc.).Itisnotatallexhaustive,butcorrespondstowhatIknow!Itisenoughtounderstandhowhighist...

Lithographyisthestepthatallowsthedefinitionofthepatternonthesubstrate:thankstoapolymerresist,ａndusingaradiationsexposure,itfabricatesamaskabovethematerialtobepatterned.Itisacriticalsteptogettheshapesofthemicrostructures,eitherinMEMSormicroe...

Lift-offprocessinmicrostructuringtechnologyisamethodofcreatingstructures(patterning)ofatargetmaterialonthesurfaceofasubstrate(ex.wafer)usingasacrificialmaterial(ex.Photoresist).Itisanadditivetechniqueasopposedtomoretraditionalsubtractingtec...